Hi-WAFER®

 

Hi-WAFER® (Hydrogen Annealed Wafer) is heat treated in hydrogen ambient, and realized high BMD density which provides gettering ability as well as COP-free zone in the wafers surface region. These properties contributes to have excellent gate oxide quality.

 

 

AT-WAFER

 

AT-WAFER is also an annealed wafer, but heat treated in Argon gas ambient to prevent outdiffusion of dopant from wafer surface and to have flat resistivity profile in depth. AT-WAFER serves the same quality as Hyper Hi-WAFER® in other aspects.