Wafering
- Wafering process

Slicing

Slice ingot to pieces of as-cut wafers
As-cut Cleaning

Wash out glue,slury and dirt on wafer surface after slicing
Edge Grinding

Fine grind edge of wafer to remove edge mechanical stress
Lapping

Enhance wafer flatness
Post-lapping Cleaning

Wash out slury,metal dirt on wafer surface after lapping
Etching

Remove surface damage caused by lapping process
Resistivity Stabilizing

Remove thermal donor cause by oxygen clusters
Backside Gettering

Make good extrinsic gettering to trap metal on the back side of during thermal process at epi house/foundry
Backside Oxide Sealing

Prevent substrate dopant going from backside of wafer,which benefit resistivity uniformity at front side
Polishing

Make mirror-like surface ready for epi or device process
Pre-cleaning

Remove slurry and reduce metal/particle level on wafers surface
Geometry Chech

Inspect wafer geometry by automatic sorter
Appearance Inspection

Inspect wafer appearance by naked-eye and auxiliary light source
Final Cleaning

Reduce metal/particle level to meet customer request
Laser Scanning

Scan wafer surface by automatioc machine to ensure the particle and defect under certain level