Wafering
- Wafering process
Slicing
Slice ingot to pieces of as-cut wafers
As-cut Cleaning
Wash out glue,slury and dirt on wafer surface after slicing
Edge Grinding
Fine grind edge of wafer to remove edge mechanical stress
Lapping
Enhance wafer flatness
Post-lapping Cleaning
Wash out slury,metal dirt on wafer surface after lapping
Etching
Remove surface damage caused by lapping process
Resistivity Stabilizing
Remove thermal donor cause by oxygen clusters
Backside Gettering
Make good extrinsic gettering to trap metal on the back side of during thermal process at epi house/foundry
Backside Oxide Sealing
Prevent substrate dopant going from backside of wafer,which benefit resistivity uniformity at front side
Polishing
Make mirror-like surface ready for epi or device process
Pre-cleaning
Remove slurry and reduce metal/particle level on wafers surface
Geometry Chech
Inspect wafer geometry by automatic sorter
Appearance Inspection
Inspect wafer appearance by naked-eye and auxiliary light source
Final Cleaning
Reduce metal/particle level to meet customer request
Laser Scanning
Scan wafer surface by automatioc machine to ensure the particle and defect under certain level